Scope of Service

Scope of Service

• Accelerated Corrosion Test
• Composition Measurement
• Contamination Study
• Corrosion Study
• Cross-Section Analysis
• Crystal Analysis
• Imaging Microscopy Analysis
• Major Elements and Dopants Depth Profiling
• Materials Reverse Engineering
• Mechanical Test
• Metallurgy Analysis
• Morphology and Topography
• Nano Materials Characterization
• Optical Properties Measurement
• Polymer Analysis
• Powder Characterization
• Standard Materials and Properties Testing
• Surface Chemistry
• Thermal Analysis
• Thin Film Tribology

Contamination Study

Contamination is the present of impurity or un-wanted substance in a material that affect the manufacturing process and the quality of the final product. Material Analysis on these contamination is essential in order to locate and identify the constituent of the contamination, and very often to match with the expected contamination sources.

Depends on the type of contaminants (organic or inorganic), the size (large or tiny), the amount (in few % or in ppm level), the location (at the surface, at the interface or bulk) and distribution (evenly distributed or localized), different analytical techniques can be used to identify the constituent present in the contaminants, no matter it is particles, residues, stains and haze.

Related Techniques:

Particles

• AES (at%, in tens of nanometer order)
• FTIR Microscope (molecular fingerprint, tens of micron order)
• Raman Microscope (molecular fingerprint, tens of micron order)
• SEM/EDS (at%, in micron order)
• TEM/EDX (at%, from several to tens of nanometer order)
• ToF-SIMS (molecular mass fragment, tens of micron order)
• XRD (crystal patterns, tens of mm order)

Residues

• AES (at%, in tens of nanometer order)
• FTIR Microscope (molecular fingerprint, tens of micron order)
• Raman Microscope (molecular fingerprint, tens of micron order)
• XPS (at% and chemical states, in tens of micron order)
• ToF-SIMS (molecular mass fragment, tens of micron order)
• XRD (crystal patterns, tens of mm order)

Discolorations, Stains

• AES (at%, in tens of nanometer order, depth of nano-scale)
• XPS (at% and chemical states, in tens of micron order, depth of tens of nanometer)
• ToF-SIMS (molecular mass fragment in ppm level, in tens of micron order)

Haze

• SEM (direct imaging, gold sputtering may be needed)
• Alpha Profilometry (surface scanning/imaging)
• AFM (surface scanning/imaging)
• Optical Profilometry (surface scanning/imaging)

Layer

• SEM/EDS (at%, in micron order)
• XPS (at% and chemical states, in tens of micron order)
• AES (at%, in tens of nanometer order)
• D-SIMS (at% in ppm level, in tens of micron order)